Vacuum Deposition System SolutionVacuum coating is a thin-film technology in which materials are vaporized or ionized in a high-vacuum environment and deposited onto the surface of substrates to form functional films, such as anti-reflection, high reflectivity, conductivity, wear resistance, or decorative coatings.
The MANST vacuum coating system consists of a vacuum chamber, vacuum pumping system, power supply and control system, coating sources, loading and unloading systems, and other integrated components.
The equipment is widely applied in optical, semiconductor, photovoltaic (PV), display panel, decorative, Low-E curtain wall, and hard coating industries.
Single-Unit Modular Magnetron Sputtering CoaterThis system deposits hard, dielectric, and conductive films for applications such as hard coatings, fuel cell bipolar plates, and decorative finishes. Featuring a planetary rotation stage for full-surface coating, it supports reactive or metallic sputtering through configurable target materials to achieve the desired product performance.Detailed Introduction
Continuous-Line Magnetron Sputtering Vacuum Coating EquipmentOur continuous-line magnetron sputtering vacuum coating equipment delivers high-precision film deposition for a wide range of industries, including photovoltaics, touch displays, optics, decorative coatings, and electromagnetic shielding. It enables uniform deposition of both dielectric and conductive films with exceptional consistency.
For perovskite photovoltaic applications, the system is equipped with a low-damage cathode design that effectively protects delicate functional layers while minimizing high-energy electron damage, ensuring superior device performance.
For other applications, the equipment can be fully customized by sequentially arranging target materials according to your specific process requirements, allowing you to achieve the exact film properties and product performance you needDetailed Introduction
Horizontal Point Source Evaporation SystemThis system is designed for the deposition of organic, metallic, and inorganic materials in applications such as photovoltaics (PV), OLED, and QLED.
It features distributed point evaporation sources, configurable as metal or ceramic based on material properties, with the number of sources flexibly adjusted according to substrate width and product requirements.
A high-precision quartz crystal monitoring system (QCM) is integrated for accurate film thickness control.
In terms of coating uniformity, a mode combining PID control with a crystal oscillator is used to regulate the point-source evaporation temperature and the material evaporation rate.Detailed Introduction











